Title :
Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography
Author :
Roelkens, Gunther ; Dumon, Pieter ; Bogaerts, Wim ; Van Thourhout, Dries ; Baets, Roel
Author_Institution :
Dept. of Inf. Technol., Ghent Univ., Gent, Belgium
Abstract :
We present a silicon-on-insulator (SOI) waveguide to fiber coupler fabricated using 248-nm-deep ultraviolet lithography. The loss of the taper structure is around 1 dB while the coupling loss from a lensed fiber into a 590-nm-wide SOI waveguide was measured to be 1.9 dB.
Keywords :
integrated optics; optical fibre couplers; optical fibre fabrication; silicon-on-insulator; ultraviolet lithography; 1 dB; 248 nm; 590 nm; SOI waveguide; Si; coupling loss; deep UV lithography; fiber coupler; lensed fiber; optical fabrication; silicon-on-insulator; taper structure loss; CMOS technology; Lithography; Optical devices; Optical fiber couplers; Optical fiber polarization; Optical fibers; Optical losses; Optical waveguides; Polymers; Silicon on insulator technology; Integrated optics; silicon-on-insulator technology;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2005.859132
