• DocumentCode
    12403
  • Title

    Bilayer Graphene Tunneling FET for Sub-0.2 V Digital CMOS Logic Applications

  • Author

    Agarwal, Tarun K. ; Nourbakhsh, Amirhasan ; Raghavan, Praveen ; Radu, Iuliana ; De Gendt, Stefan ; Heyns, Marc ; Verhelst, Marian ; Thean, A.

  • Author_Institution
    Dept. of Electr. Eng., Katholieke Univ. Leuven, Leuven, Belgium
  • Volume
    35
  • Issue
    12
  • fYear
    2014
  • fDate
    Dec. 2014
  • Firstpage
    1308
  • Lastpage
    1310
  • Abstract
    We propose a bilayer graphene (BLG) tunneling field-effect-transistor (TFET) suitable for digital CMOS logic circuits. The ultimate performance limit of this structure is evaluated by solving the quantum transport equations in nonequilibrium Green´s function framework. A bandgap opening is induced in BLG using both vertical electric field and top-bottom asymmetric chemical doping. To overcome the limitations of nonabrupt p-i-n junctions using practical process methods, source/drain regions are created using work-function engineered metal-graphene contacts. We evaluate the performance of BLG-TFET by taking doping gradient due to contact induced doping into account. Our BLG-TFET exhibits a subthreshold slope as low as 35 mV/dec, and ION/IOFF as high as 2910 for a supply voltage of 0.2 V. The proposed BLG-TFET shows promise for ultralow-power applications, particularly in low to medium speed applications.
  • Keywords
    CMOS logic circuits; Green´s function methods; electric fields; field effect transistor circuits; graphene; integrated circuit design; semiconductor doping; semiconductor junctions; tunnelling; BLG tunneling field-effect-transistor; BLG-TFET; C; bandgap opening; bilayer graphene tunneling FET; digital CMOS logic applications; digital CMOS logic circuits; doping gradient; electric field; field effect transistor; medium speed applications; metal-graphene contacts; nonabrupt p-i-n junctions; nonequilibrium Green function; quantum transport equations; source-drain regions; top-bottom asymmetric chemical doping; ultralow-power applications; voltage 0.2 V; CMOS logic circuits; Doping; Graphene; Junctions; PIN photodiodes; Photonic band gap; Tunneling; Bilayer graphene; TFET; contact induced doping; digital CMOS logic;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2014.2364260
  • Filename
    6936851