Title :
Effect of Thickness of the p-AlGaN Electron Blocking Layer on the Improvement of ESD Characteristics in GaN-Based LEDs
Author :
Jang, Chung-Hsun ; Sheu, J.K. ; Tsai, C.M. ; Shei, S.C. ; Lai, W.C. ; Chang, S.J.
Author_Institution :
Inst. of Microelectron. & Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan
fDate :
7/1/2008 12:00:00 AM
Abstract :
The following letter presents a study regarding GaN-based light-emitting diodes (LEDs) with p-type AlGaN electron blocking layers (EBLs) of different thicknesses. The study revealed that the LEDs could endure higher electrostatic discharge (ESD) levels as the thickness of the AlGaN EBL increased. The observed improvement in the ESD endurance ability could be attributed to the fact that the thickened p-AlGaN EBL may partly fill the dislocation-related pits that occur on the surface of the InGaN-GaN multiple-quantum well (MQW) and that are due to the strain and the low-temperature-growth process. If these dislocation-related pits are not partly suppressed, they will eventually result in numerous surface pits associated with threading dislocations that intersect the InGaN-GaN (MQW), thereby reducing the ESD endurance ability. The results of the experiment show that the ESD endurance voltages could increase from 1500 to 6000 V when the thickness of the p-AlGaN EBL in the GaN LEDs is increased from 32.5 to 130 nm, while the forward voltages and light output powers remained almost the same.
Keywords :
III-V semiconductors; aluminium compounds; dislocations; electrostatic discharge; gallium compounds; indium compounds; light emitting diodes; quantum well devices; wide band gap semiconductors; AlGaN-InGaN-GaN; ESD endurance ability; dislocation-related pits; electron blocking layer; electrostatic discharge levels; forward voltages; light output power; light-emitting diodes; low-temperature-growth process; multiple-quantum well; surface pits; threading dislocations; voltage 1500 V to 6000 V; Aluminum gallium nitride; Capacitive sensors; Electrons; Electrostatic discharge; Gallium nitride; Light emitting diodes; Power generation; Quantum well devices; Surface discharges; Voltage; AlGaN; GaN light-emitting diode (LED); electron blocking layer (EBL); electrostatic discharge (ESD);
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2008.924886