YBa2Cu3O7-x deposition of large moving plates for continuous processing

YBa₂Cu₃O_7-x thin films can be deposited on substrates up to 20 cm × 20 cm using thermal reactive co-evaporation with a linear reciprocating oxygen pocket. In order to coat larger area or in a continuous way, the substrate has to be moved through the deposition zone. Therefore, the substrate is fixed in a slide and shuttled by a transport system. On small samples critical current densities (J_c) over 3 MA/cm² were achieved while on 10 cm × 20 cm sapphire substrates a J_c of 2.2 MA/cm² could be reached. On ion-beam-assisted deposition (IBAD) buffered aluminum oxide ceramic we attain critical current densities of 1.4 MA/cm² and 1.5 MA/cm² on IBAD buffered metal tapes.