DocumentCode :
1242561
Title :
Subwavelength Silica-Based Optical Waveguide With a Multilayered Buffer for Sharp Bending
Author :
Dai, Daoxin
Author_Institution :
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
Volume :
27
Issue :
13
fYear :
2009
fDate :
7/1/2009 12:00:00 AM
Firstpage :
2489
Lastpage :
2494
Abstract :
A subwavelength SiO2-based optical waveguide with an air cladding and a multilayered buffer is presented. This multilayered buffer includes alternating low and high refractive index dielectric layers. The thicknesses of these dielectric layers are chosen optimally by using genetic algorithm so that the theoretical leakage loss of the present optical waveguide is minimized (<0.001 dB/mm at the central wavelength, e.g., 1550 nm). The modal analysis with a full-vectorial finite-difference method shows that the present SiO2 optical waveguide has the ability of sharp bending with a very small bending radius (~ 10 mum).
Keywords :
bending; dielectric thin films; finite difference time-domain analysis; genetic algorithms; integrated optics; optical losses; optical multilayers; optical waveguides; silicon compounds; SiO2; air cladding; full-vectorial finite-difference method; genetic algorithm; high-refractive index dielectric layers; leakage loss; low-refractive index dielectric layers; modal analysis; multilayered buffer; photonic integration circuits; sharp bending; subwavelength silica-based optical waveguide; wavelength 1550 nm; ${rm SiO}_{2}$ ; Bending; genetic algorithm; leakage loss; multilayered;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2008.2011501
Filename :
4815442
Link To Document :
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