DocumentCode
1243390
Title
Geometric components of charge pumping current in SOS devices
Author
Stahlbush, R.E. ; Lawrence, R.K. ; Richards, W.
Author_Institution
US Naval Res. Lab., Washington, DC, USA
Volume
36
Issue
6
fYear
1989
fDate
12/1/1989 12:00:00 AM
Firstpage
1998
Lastpage
2005
Abstract
Charge-pumping measurements of the spectral distribution of interface states are performed on three SOS device structures. In contrast to bulk devices with similar channel geometries, there is significant bulk recombination in addition to the normally present interface-state recombination. The bulk recombination produces a sharp upturn in the interface-state density near the bandgap edges. This upturn is an artifact of the analysis method. While it has been observed at both edges of the bandgap, it is usually stronger near the conduction band for n-channel devices and near the valence band for p-channel devices. In the remainder of the bandgap, the interface-state density is accurately measured. Following X-ray exposure, the interface-state density increases, whereas the upturns near the band edges are virtually unchanged. Unlike the case for bulk devices, it is shown that geometric constraints on the motion of majority carriers play an important role in producing recombination at bulk traps. A model is presented that addresses the carrier motion and describes the dependence of the bulk recombination on the channel geometry
Keywords
X-ray effects; electron-hole recombination; electronic density of states; insulated gate field effect transistors; interface electron states; semiconductor-insulator boundaries; MOSFET; SOS device structures; Si-Al2O3; X-ray exposure; bandgap edges; bulk traps; carrier motion; channel geometry; charge pumping current; geometric constraints; interface-state density; interface-state recombination; majority carriers; n-channel devices; p-channel devices; spectral distribution; valence band; Charge measurement; Charge pumps; Current measurement; Density measurement; Geometry; Interface states; Isolation technology; MOSFETs; Photonic band gap; Silicon on insulator technology;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/23.45397
Filename
45397
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