Title :
Aerosol doped Nd planar silica waveguide laser
Author :
Bonar, J. ; Bebbington, J.A. ; Aitchison, J.S. ; Maxwell, G.D. ; Ainslie, B.J.
Author_Institution :
Dept. of Electron. & Electr. Eng., Glasgow Univ., UK
fDate :
1/19/1995 12:00:00 AM
Abstract :
Aerosol doped neodymium planar silica waveguide lasers on silicon are reported for the first time. The waveguide lasers were fabricated by a combination of flame hydrolysis deposition (FHD) and reactive ion etching (RIE). A threshold of 22 mW and a slope efficiency of 2.5% were achieved
Keywords :
aerosols; neodymium; optical fabrication; optical planar waveguides; silicon compounds; spray coatings; sputter etching; waveguide lasers; 2.5 percent; 22 mW; SiO2:Nd; aerosol doping method; flame hydrolysis deposition; planar silica waveguide laser; reactive ion etching; slope efficiency; threshold;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19950086
