• DocumentCode
    1243410
  • Title

    Aerosol doped Nd planar silica waveguide laser

  • Author

    Bonar, J. ; Bebbington, J.A. ; Aitchison, J.S. ; Maxwell, G.D. ; Ainslie, B.J.

  • Author_Institution
    Dept. of Electron. & Electr. Eng., Glasgow Univ., UK
  • Volume
    31
  • Issue
    2
  • fYear
    1995
  • fDate
    1/19/1995 12:00:00 AM
  • Firstpage
    99
  • Lastpage
    100
  • Abstract
    Aerosol doped neodymium planar silica waveguide lasers on silicon are reported for the first time. The waveguide lasers were fabricated by a combination of flame hydrolysis deposition (FHD) and reactive ion etching (RIE). A threshold of 22 mW and a slope efficiency of 2.5% were achieved
  • Keywords
    aerosols; neodymium; optical fabrication; optical planar waveguides; silicon compounds; spray coatings; sputter etching; waveguide lasers; 2.5 percent; 22 mW; SiO2:Nd; aerosol doping method; flame hydrolysis deposition; planar silica waveguide laser; reactive ion etching; slope efficiency; threshold;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19950086
  • Filename
    364370
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1243410