• DocumentCode
    1245065
  • Title

    High temperature performance and operation of HFETs

  • Author

    Wilson, Craig D. ; O´Neill, Anthony G. ; Baier, Steven M. ; Nohava, James C.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Newcastle upon Tyne Univ., UK
  • Volume
    43
  • Issue
    2
  • fYear
    1996
  • fDate
    2/1/1996 12:00:00 AM
  • Firstpage
    201
  • Lastpage
    206
  • Abstract
    The high temperature performance of Al0.75Ga0.25 As/In0.25Ga0.75As/GaAs Complementary Heterojunction FETs (CHFETs) is reported between 25 and 500°C. Both experimental and modeled devices have shown acceptable digital characteristics to 400°C. Digital logic circuits have also been shown to operate at temperatures of over 400°C. This strongly suggests that GaAs based devices are capable of satisfying high temperature electronics requirements in the 125-400°C range. Two dimensional physically based modeling has been used to understand the high temperature operation of the HFETs. This work has shown that the devices suffer from gate limited drain leakage currents at elevated ambient temperatures. This off-state leakage current is higher than anticipated. Simulation has shown that, although forward gate leakage currents are reduced with the heterostructure device design, the reverse current is not
  • Keywords
    III-V semiconductors; aluminium compounds; field effect digital integrated circuits; field effect transistors; gallium arsenide; indium compounds; leakage currents; semiconductor device models; semiconductor heterojunctions; 25 to 500 degC; Al0.75Ga0.25As-In0.25Ga0.75 As-GaAs; Al0.75Ga0.25As/In0.25Ga0.75 As/GaAs; CHFET; complementary heterojunction FET; digital characteristics; gate limited drain leakage currents; high temperature electronics; high temperature performance; logic circuits; off-state leakage current; physically based modeling; reverse current; FETs; Fabrication; Gallium arsenide; HEMTs; Leakage current; MESFETs; MODFETs; Silicon; Space technology; Temperature distribution;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.481718
  • Filename
    481718