DocumentCode :
1245065
Title :
High temperature performance and operation of HFETs
Author :
Wilson, Craig D. ; O´Neill, Anthony G. ; Baier, Steven M. ; Nohava, James C.
Author_Institution :
Dept. of Electr. & Electron. Eng., Newcastle upon Tyne Univ., UK
Volume :
43
Issue :
2
fYear :
1996
fDate :
2/1/1996 12:00:00 AM
Firstpage :
201
Lastpage :
206
Abstract :
The high temperature performance of Al0.75Ga0.25 As/In0.25Ga0.75As/GaAs Complementary Heterojunction FETs (CHFETs) is reported between 25 and 500°C. Both experimental and modeled devices have shown acceptable digital characteristics to 400°C. Digital logic circuits have also been shown to operate at temperatures of over 400°C. This strongly suggests that GaAs based devices are capable of satisfying high temperature electronics requirements in the 125-400°C range. Two dimensional physically based modeling has been used to understand the high temperature operation of the HFETs. This work has shown that the devices suffer from gate limited drain leakage currents at elevated ambient temperatures. This off-state leakage current is higher than anticipated. Simulation has shown that, although forward gate leakage currents are reduced with the heterostructure device design, the reverse current is not
Keywords :
III-V semiconductors; aluminium compounds; field effect digital integrated circuits; field effect transistors; gallium arsenide; indium compounds; leakage currents; semiconductor device models; semiconductor heterojunctions; 25 to 500 degC; Al0.75Ga0.25As-In0.25Ga0.75 As-GaAs; Al0.75Ga0.25As/In0.25Ga0.75 As/GaAs; CHFET; complementary heterojunction FET; digital characteristics; gate limited drain leakage currents; high temperature electronics; high temperature performance; logic circuits; off-state leakage current; physically based modeling; reverse current; FETs; Fabrication; Gallium arsenide; HEMTs; Leakage current; MESFETs; MODFETs; Silicon; Space technology; Temperature distribution;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.481718
Filename :
481718
Link To Document :
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