DocumentCode
1245076
Title
Delay time analysis of submicron InP-based HEMT´s
Author
Kwon, Youngwoo ; Pavlidis, Dimitris
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
Volume
43
Issue
2
fYear
1996
fDate
2/1/1996 12:00:00 AM
Firstpage
228
Lastpage
237
Abstract
The intrinsic delay time of submicron InP-based HEMT´s has been evaluated by coupling the delay time analysis with a 2D Ensemble Monte Carlo Simulation. The relationship between the delay time and the transit time is explained. It is shown that the delay time can be quite different from the transit time depending on the velocity modulation. The delay from each segment of the HEMT is calculated to study the distribution of the delay inside the device. The delay from the gate region was the major contributor while that from the drain region was also important. The bias dependence of the delay in each region of the device was calculated to explain the bias dependence of the total intrinsic delay time. The intrinsic delay time increase at low Vgs was due to the increase of τd and τs and the increase at high Vds was due to the increase of τd. As a means of validation, the simulated data have been compared with experimental intrinsic delay time data at various bias points. Good agreement was found over a wide Vgs and V ds range
Keywords
III-V semiconductors; Monte Carlo methods; delays; high electron mobility transistors; indium compounds; semiconductor device models; 2D ensemble Monte Carlo simulation; InP; bias dependence; delay time; submicron HEMTs; transit time; velocity modulation; Application specific integrated circuits; Cutoff frequency; Data mining; Delay effects; Electrons; HEMTs; Integrated circuit technology; MMICs; Microwave integrated circuits; Propagation delay;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.481722
Filename
481722
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