• DocumentCode
    1245076
  • Title

    Delay time analysis of submicron InP-based HEMT´s

  • Author

    Kwon, Youngwoo ; Pavlidis, Dimitris

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
  • Volume
    43
  • Issue
    2
  • fYear
    1996
  • fDate
    2/1/1996 12:00:00 AM
  • Firstpage
    228
  • Lastpage
    237
  • Abstract
    The intrinsic delay time of submicron InP-based HEMT´s has been evaluated by coupling the delay time analysis with a 2D Ensemble Monte Carlo Simulation. The relationship between the delay time and the transit time is explained. It is shown that the delay time can be quite different from the transit time depending on the velocity modulation. The delay from each segment of the HEMT is calculated to study the distribution of the delay inside the device. The delay from the gate region was the major contributor while that from the drain region was also important. The bias dependence of the delay in each region of the device was calculated to explain the bias dependence of the total intrinsic delay time. The intrinsic delay time increase at low Vgs was due to the increase of τd and τs and the increase at high Vds was due to the increase of τd. As a means of validation, the simulated data have been compared with experimental intrinsic delay time data at various bias points. Good agreement was found over a wide Vgs and V ds range
  • Keywords
    III-V semiconductors; Monte Carlo methods; delays; high electron mobility transistors; indium compounds; semiconductor device models; 2D ensemble Monte Carlo simulation; InP; bias dependence; delay time; submicron HEMTs; transit time; velocity modulation; Application specific integrated circuits; Cutoff frequency; Data mining; Delay effects; Electrons; HEMTs; Integrated circuit technology; MMICs; Microwave integrated circuits; Propagation delay;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.481722
  • Filename
    481722