• DocumentCode
    1245216
  • Title

    A design solution to increasing the sensitivity of pMOS dosimeters: the stacked RADFET approach

  • Author

    Kelleher, A. ; Lane, W. ; Adams, Leonard

  • Author_Institution
    Nat. Microelectron. Res. Centre, Cork, Ireland
  • Volume
    42
  • Issue
    1
  • fYear
    1995
  • fDate
    2/1/1995 12:00:00 AM
  • Firstpage
    48
  • Lastpage
    51
  • Abstract
    pMOS radiation sensitive field effect transistors (RADFET´s) have applications as integrating dosimeters in spacecraft, laboratories and medicine to measure the amount of radiation dose absorbed. The suitability of these dosimeters to a certain application depends on the sensitivity of the RADFET being used. To date, this sensitivity is limited to the sensitivity of the gate oxide to radiation. The aim of this paper is to introduce a new design approach which will allow greater sensitivities to be achieved than is currently possible. An additional attractive feature of this design approach is that the sensitivity of the dosimeter may be changed depending on the total dose which is to be measured; essentially a dosimeter with auto-scaling may be achieved. This study introduces this auto-scaling concept along with presenting the optimum RADFET device requirements which are necessary for this new design approach
  • Keywords
    MOSFET; dosimeters; absorbed radiation dose; autoscaling; design solution; gate oxide; integrating dosimeters; laboratories; medicine; optimum RADFET device requirements; pMOS dosimeters; radiation sensitive field effect transistors; sensitivity increase; spacecraft; stacked RADFET approach; Dosimetry; Helium; Interface states; Ionizing radiation; Laboratories; MOSFET circuits; Nuclear measurements; Personnel; Space vehicles; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.364881
  • Filename
    364881