DocumentCode
1245216
Title
A design solution to increasing the sensitivity of pMOS dosimeters: the stacked RADFET approach
Author
Kelleher, A. ; Lane, W. ; Adams, Leonard
Author_Institution
Nat. Microelectron. Res. Centre, Cork, Ireland
Volume
42
Issue
1
fYear
1995
fDate
2/1/1995 12:00:00 AM
Firstpage
48
Lastpage
51
Abstract
pMOS radiation sensitive field effect transistors (RADFET´s) have applications as integrating dosimeters in spacecraft, laboratories and medicine to measure the amount of radiation dose absorbed. The suitability of these dosimeters to a certain application depends on the sensitivity of the RADFET being used. To date, this sensitivity is limited to the sensitivity of the gate oxide to radiation. The aim of this paper is to introduce a new design approach which will allow greater sensitivities to be achieved than is currently possible. An additional attractive feature of this design approach is that the sensitivity of the dosimeter may be changed depending on the total dose which is to be measured; essentially a dosimeter with auto-scaling may be achieved. This study introduces this auto-scaling concept along with presenting the optimum RADFET device requirements which are necessary for this new design approach
Keywords
MOSFET; dosimeters; absorbed radiation dose; autoscaling; design solution; gate oxide; integrating dosimeters; laboratories; medicine; optimum RADFET device requirements; pMOS dosimeters; radiation sensitive field effect transistors; sensitivity increase; spacecraft; stacked RADFET approach; Dosimetry; Helium; Interface states; Ionizing radiation; Laboratories; MOSFET circuits; Nuclear measurements; Personnel; Space vehicles; Threshold voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/23.364881
Filename
364881
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