An accurate intrinsic capacitance modeling for deep submicrometer MOSFET´s

This paper presents a new approach to the modeling of MOSFET capacitive characteristics for accurate simulation of deep submicrometer integrated circuits. The C-V characteristics of our new quasistatic intrinsic capacitance model accurately describes the short channel effects of deep submicrometer MOSFET´s by accounting for velocity saturation and series resistance effects. The use of charge equations consistent with the short channel I-V characteristics leads to C-V characteristics which preserve all major short channel effects. The C-V calculation, based on nonpinned surface potential approach and drift-diffusion model, shows highly accurate short-channel effects and inherently smooth transitions for all conditions of device operation. The accuracy of the C-V characteristics has been demonstrated by comparison with the Ward-Dutton model and PISCES simulation results