DocumentCode
1247316
Title
A forward body-biased low-leakage SRAM cache: device, circuit and architecture considerations
Author
Kim, Chris Hyung-il ; Jae-Joon Kim ; Mukhopadhyay, Saibal ; Roy, Kaushik
Author_Institution
IBM T.J. Watson Res. Center, Yorktown Heights, NY, USA
Volume
13
Issue
3
fYear
2005
fDate
3/1/2005 12:00:00 AM
Firstpage
349
Lastpage
357
Abstract
This paper presents a forward body-biasing (FBB) technique for active and standby leakage power reduction in cache memories. Unlike previous low-leakage SRAM approaches, we include device level optimization into the design. We utilize super high Vt (threshold voltage) devices to suppress the cache leakage power, while dynamically FBB only the selected SRAM cells for fast operation. In order to build a super high Vt device, the two-dimensional (2-D) halo doping profile was optimized considering various nanoscale leakage mechanisms. The transition latency and energy overhead associated with FBB was minimized by waking up the SRAM cells ahead of the access and exploiting the general cache access pattern. The combined device-circuit-architecture level techniques offer 64% total leakage reduction and 7.3% improvement in bit line delay compared to a previous state-of-the-art low-leakage SRAM technique. Static noise margin of the proposed SRAM cell is comparable to conventional SRAM cells.
Keywords
CMOS memory circuits; SRAM chips; cache storage; integrated circuit design; integrated circuit noise; CMOS technology; SRAM cache memories; SRAM cells; combined device-circuit-architecture level techniques; device-circuit-architecture level technique; forward body biasing technique; leakage power reduction; nanoscale leakage mechanism; static noise margin; threshold voltage devices; transition latency; two dimensional halo doping profile; CMOS technology; Cache memory; Circuits; Design optimization; Doping profiles; Microprocessors; Nanoscale devices; Random access memory; Threshold voltage; Two dimensional displays; Forward body-biasing (FBB); SRAM; halo doping; leakage power; super high;
fLanguage
English
Journal_Title
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
Publisher
ieee
ISSN
1063-8210
Type
jour
DOI
10.1109/TVLSI.2004.842903
Filename
1406041
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