• DocumentCode
    1247316
  • Title

    A forward body-biased low-leakage SRAM cache: device, circuit and architecture considerations

  • Author

    Kim, Chris Hyung-il ; Jae-Joon Kim ; Mukhopadhyay, Saibal ; Roy, Kaushik

  • Author_Institution
    IBM T.J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    13
  • Issue
    3
  • fYear
    2005
  • fDate
    3/1/2005 12:00:00 AM
  • Firstpage
    349
  • Lastpage
    357
  • Abstract
    This paper presents a forward body-biasing (FBB) technique for active and standby leakage power reduction in cache memories. Unlike previous low-leakage SRAM approaches, we include device level optimization into the design. We utilize super high Vt (threshold voltage) devices to suppress the cache leakage power, while dynamically FBB only the selected SRAM cells for fast operation. In order to build a super high Vt device, the two-dimensional (2-D) halo doping profile was optimized considering various nanoscale leakage mechanisms. The transition latency and energy overhead associated with FBB was minimized by waking up the SRAM cells ahead of the access and exploiting the general cache access pattern. The combined device-circuit-architecture level techniques offer 64% total leakage reduction and 7.3% improvement in bit line delay compared to a previous state-of-the-art low-leakage SRAM technique. Static noise margin of the proposed SRAM cell is comparable to conventional SRAM cells.
  • Keywords
    CMOS memory circuits; SRAM chips; cache storage; integrated circuit design; integrated circuit noise; CMOS technology; SRAM cache memories; SRAM cells; combined device-circuit-architecture level techniques; device-circuit-architecture level technique; forward body biasing technique; leakage power reduction; nanoscale leakage mechanism; static noise margin; threshold voltage devices; transition latency; two dimensional halo doping profile; CMOS technology; Cache memory; Circuits; Design optimization; Doping profiles; Microprocessors; Nanoscale devices; Random access memory; Threshold voltage; Two dimensional displays; Forward body-biasing (FBB); SRAM; halo doping; leakage power; super high;
  • fLanguage
    English
  • Journal_Title
    Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1063-8210
  • Type

    jour

  • DOI
    10.1109/TVLSI.2004.842903
  • Filename
    1406041