• DocumentCode
    1247878
  • Title

    Conversion Efficiency Enhancement of GaN/In _{0.11} Ga _{0.89} N Solar Cells With Nano Patterne

  • Author

    Wang, H.W. ; Chen, H.C. ; Chang, Y.A. ; Lin, C.C. ; Han, H.W. ; Tsai, M.A. ; Kuo, H.C. ; Yu, P. ; Lin, S.H.

  • Author_Institution
    Dept. of Electrophys., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • Volume
    23
  • Issue
    18
  • fYear
    2011
  • Firstpage
    1304
  • Lastpage
    1306
  • Abstract
    In this study, p-i-n double-heterojunction GaN/ In0.11Ga0.89 N solar cells grown by metal-organic chemical vapor deposition on pattern sapphire substrate are presented. The solar cell with standard process has a conversion efficiency of 3.1%, which corresponds to a fill factor of 58%, short circuit current density of 2.86 mA/cm2 , and open circuit voltage of 1.87 V under AM1.5G illumination. To further improve the conversion efficiency of the GaN/ In0.11Ga0.89 N solar cells, two-dimensional polystyrene nanospheres were deposited and self-organized as mask in the anisotropic inductively coupled plasma reactive ion etching process to form a biomimetic surface roughing texture. The surface morphology of the solar cell shows a periodically hexagonal bead pattern and the beads are formed in a diameter of 160 nm with a period of 250 nm. An increase of 15% in short circuit current density is found, thus improving the conversion efficiency to 3.87%. If we optimize the structure for 180 nm of the height and 375 nm of the period, a 10% gain can be expected when compared to the current structure.
  • Keywords
    III-V semiconductors; MOCVD; current density; gallium compounds; indium compounds; sapphire; solar cells; sputter etching; surface morphology; wide band gap semiconductors; Al2O3; GaN-In0.11Ga0.89N; anisotropic inductively coupled plasma reactive ion etching process; biomimetic surface antireflection process; biomimetic surface roughing texture; conversion efficiency enhancement; fill factor; metal-organic chemical vapor deposition; nanopatterned sapphire; p-i-n double-heterojunction solar cells; pattern sapphire substrate; periodically hexagonal bead pattern; short circuit current density; size 160 nm; surface morphology; two-dimensional polystyrene nanospheres; voltage 1.87 V; Epitaxial growth; Gallium nitride; Photonic band gap; Photovoltaic cells; Substrates; Surface morphology; Surface treatment; Biomimetic surface antireflection; InGaN solar cells;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2011.2160051
  • Filename
    5893914