DocumentCode :
1247952
Title :
New transverse-domain formation mechanism in a quarter-micrometre-gate HEMT
Author :
Awano, Yuji
Author_Institution :
Fujitsu Labs. Ltd., Atsugi
Volume :
24
Issue :
21
fYear :
1988
fDate :
10/13/1988 12:00:00 AM
Firstpage :
1315
Lastpage :
1317
Abstract :
Studies a quarter-micrometre-gate HEMT by a two-dimensional Monte Carlo particle simulation to gain a deeper insight into the device operation. A new transverse-domain formation due to intervalley electron transfer is predicted. The effect of domain formation on device performance and current saturation characteristics is also discussed
Keywords :
Monte Carlo methods; high electron mobility transistors; semiconductor device models; current saturation characteristics; device operation; device performance; domain formation; intervalley electron transfer; quarter-micrometre-gate HEMT; transverse-domain formation mechanism; two-dimensional Monte Carlo particle simulation;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
Filename :
5894
Link To Document :
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