DocumentCode :
1247990
Title :
Tunable capacitors employing BZN/BST thin films for RF applications
Author :
Li, Ruguan ; Jiang, Shuwen ; Gao, Libin ; Wang, Luyu ; Li, Yanrong
Author_Institution :
State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Volume :
58
Issue :
6
fYear :
2011
fDate :
6/1/2011 12:00:00 AM
Firstpage :
1140
Lastpage :
1144
Abstract :
Tunable parallel-plate capacitors employing Bi1.5Zn1.0Nb1.5O7/Ba0.5Sr0.5TiO3 (BZN/BST) thin films for RF applications are reported. The intermediate frequency measurements indicate that the BZN/BST-based varactors demonstrate large tunability of 39% at 40 V and high device quality factor of 300 at 1 MHz. The devices maintain quite low leakage current density even under a high applied bias. The quality factor analysis shows that the device quality factor is highly dependent on conductor loss of electrodes at frequencies above 1 MHz. The phase shifter employing BZN/BST-based varactors exhibits lower insertion loss than does employing semiconductor diodes at a designed frequency of 445 MHz, demonstrating the potential of tunable capacitors employing BZN/BST thin films for RF applications.
Keywords :
Q-factor; barium compounds; bismuth compounds; current density; dielectric losses; dielectric thin films; leakage currents; phase shifters; thin film capacitors; varactors; zinc compounds; zirconium compounds; Bi1.5ZnNb1.5O7-Ba0.5Sr0.5TiO3; RF applications; conductor loss; device quality factor; electrodes; frequency 1 MHz; insertion loss; intermediate frequency measurement; leakage current density; phase shifter; thin films; tunable parallel-plate capacitors; varactors; voltage 40 V; Dielectric losses; Electrodes; Phase shifters; Q factor; Varactors;
fLanguage :
English
Journal_Title :
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher :
ieee
ISSN :
0885-3010
Type :
jour
DOI :
10.1109/TUFFC.2011.1923
Filename :
5895027
Link To Document :
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