DocumentCode
1248843
Title
GaN/InGaN Heterojunction Bipolar Transistors With
Author
Shen, Shyh-Chiang ; Dupuis, Russell D. ; Lee, Yi-Che ; Kim, Hee-Jin ; Zhang, Yun ; Lochner, Zachary ; Yoder, P.Douglas ; Ryou, Jae-Hyun
Author_Institution
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Volume
32
Issue
8
fYear
2011
Firstpage
1065
Lastpage
1067
Abstract
We report GaN/InGaN n-p-n double-heterojunction bipolar transistors with the collector current density (JC) >; 16 kA/cm2 and the current gain (β) >; 24 grown on a sapphire substrate. The cutoff frequency (fT) of greater than 5 GHz and the maximum oscillation frequency (fmax) of 1.3 GHz are also measured for a GaN/InGaN heterojunction bipolar transistor at JC = 4.7 kA/cm2.
Keywords
III-V semiconductors; gallium compounds; heterojunction bipolar transistors; indium compounds; microwave bipolar transistors; wide band gap semiconductors; Al2O3; GaN-InGaN; collector current density; frequency 1.3 GHz; n-p-n double-heterojunction bipolar transistors; sapphire substrate; Aluminum gallium nitride; Double heterojunction bipolar transistors; Gallium nitride; Radio frequency; Substrates; Temperature measurement; GaN; heterojunction bipolar transistors (HBTs); radio frequency (RF);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2011.2156378
Filename
5898388
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