• DocumentCode
    1249891
  • Title

    The long and short of channel length

  • Author

    Aghdaie, Behnam ; Sheu, Bing

  • Author_Institution
    Avant! Corp., USA
  • Volume
    15
  • Issue
    5
  • fYear
    1999
  • fDate
    9/1/1999 12:00:00 AM
  • Firstpage
    47
  • Lastpage
    51
  • Abstract
    In this article, the powerful shift-and-ratio method proposed by Taur of IBM Corp. [1992] is used to accurately determine effective channel length and mobility of deep-submicron devices. We show that the extracted low field mobility of a short-channel device as a function of gate voltage is consistent with that of a long-channel device. Since in the BSIM3v3.2 industrial standard model a universal low field mobility is used for devices of various sizes, the shift-and-ratio method is particularly suitable for determining accurate effective channel length that leads to a consistent mobility value
  • Keywords
    MOSFET; carrier mobility; semiconductor device models; BSIM3v3.2 industrial standard model; MOSFET; deep-submicron devices; effective channel length; extracted low field mobility; gate voltage; shift-and-ratio method; short-channel device; Artificial intelligence; Capacitance; Circuit simulation; Computational modeling; Etching; MOS devices; Page description languages; Refining; Voltage;
  • fLanguage
    English
  • Journal_Title
    Circuits and Devices Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    8755-3996
  • Type

    jour

  • DOI
    10.1109/101.795092
  • Filename
    795092