Title : 
AlGaN/GaN double heterostructure channel modulation doped field effect transistors (MODFETs)
         
        
            Author : 
Zhifang Fan ; Changzhi Lu ; Botchkarev, A.E. ; Tang, Hongying ; Salvador, Arley ; Aktas, Ozgur ; Kim, Wonhee ; Morkoc, H.
         
        
            Author_Institution : 
Mater. Res. Lab., Illinois Univ., Urbana, IL
         
        
        
        
        
            fDate : 
4/24/1997 12:00:00 AM
         
        
        
        
            Abstract : 
AlGaN/GaN double heterostructure channel modulation doped field effect-transistors (DHCMODFETs) with a 1.5-1.75 μm gate length and 3 μm channel length exhibiting record transconductances and saturation current have been demonstrated. The maximum normalised drain current and transconductance are ~1100 mA/mm and 270 mS/mm, respectively, at room temperature. Near pinch-off, the drain breakdown voltage is ~80 V. At an elevated temperature of 300°C, the maximum drain source current and extrinsic transconductance of the device are ~500 mA/mm and 120 mS/mm, respectively
         
        
            Keywords : 
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; 300 C; AlGaN-GaN; AlGaN/GaN double heterostructure channel MODFET; drain breakdown voltage; drain current; saturation current; transconductance;
         
        
        
            Journal_Title : 
Electronics Letters
         
        
        
        
        
            DOI : 
10.1049/el:19970497