• DocumentCode
    1250419
  • Title

    Rectifying characteristics of thin film self-switching devices with ZnO deposited by atomic layer deposition

  • Author

    Soga, I. ; Komuro, Atsushi ; Tsuboi, O.

  • Author_Institution
    Fujitsu Labs., Atsugi, Japan
  • Volume
    48
  • Issue
    15
  • fYear
    2012
  • Firstpage
    914
  • Lastpage
    916
  • Abstract
    To realise a rectifying device utilising ZnO, self-switching devices (SSDs) have been fabricated using ZnO thin films. The SSDs do not require a p-type doping junction or a Schottky barrier. At first, normally-off ZnO thin film transistors were fabricated, which exhibited control of threshold voltage by the channel length. Thin film SSDs using a thin film transistor structure were successfully fabricated by connecting the gate electrode with the source electrode. Finally, half-wave rectification using thin film SSDs is demonstrated, which reveals the possibility of ZnO thin film SSDs for power supply.
  • Keywords
    II-VI semiconductors; atomic layer deposition; rectification; thin film transistors; zinc compounds; Schottky barrier; ZnO deposition; atomic layer deposition; gate electrode; half-wave rectification; p-type doping junction; rectifying characteristics; rectifying device; source electrode; thin film self-switching devices; thin film transistors;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2012.1073
  • Filename
    6248333