DocumentCode :
1250589
Title :
Developing infrastructure to mass-produce MEMS
Author :
Markus, Karen W.
Author_Institution :
MEMS Technol. Applications Center, MCNC, Research Triangle Park, NC, USA
Volume :
4
Issue :
1
fYear :
1997
Firstpage :
49
Lastpage :
54
Abstract :
Though microelectromechanical systems are often made from silicon, the existing semiconductor technology base faces numerous challenges to meet the special requirements of fabricating MEMS devices. To realize economies of scale, seven aspects of MEMS manufacturing infrastructure must be improved: computer aided design and simulation; lithography; etching; parametric testing; functional testing; packaging; and capital equipment
Keywords :
circuit analysis computing; etching; integrated circuit testing; lithography; micromechanical devices; semiconductor device manufacture; MEMS device fabrication; MEMS manufacturing infrastructure; MEMS mass production; capital equipment; computer aided design; etching; functional testing; lithography; microelectromechanical systems; packaging; parametric testing; semiconductor technology base; simulation; Computational modeling; Computer aided manufacturing; Economies of scale; Microelectromechanical devices; Microelectromechanical systems; Micromechanical devices; Semiconductor device manufacture; Silicon; Testing; Virtual manufacturing;
fLanguage :
English
Journal_Title :
Computational Science & Engineering, IEEE
Publisher :
ieee
ISSN :
1070-9924
Type :
jour
DOI :
10.1109/99.590857
Filename :
590857
Link To Document :
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