• DocumentCode
    1250720
  • Title

    Dielectric breakdown of a residual SF6 plasma at 3000 K under diatomic equilibrium

  • Author

    Yan, J.D. ; Fang, M.T.C. ; Liu, Q.S.

  • Author_Institution
    Dept. of Electr. Eng. & Electron., Liverpool Univ., UK
  • Volume
    4
  • Issue
    1
  • fYear
    1997
  • fDate
    2/1/1997 12:00:00 AM
  • Firstpage
    114
  • Lastpage
    119
  • Abstract
    A residual plasma at 3000 K and under diatomic equilibrium is left inside an axially blown gas blast SF6 circuit breaker after the thermal extinction of an arc. The breakdown of such a residual plasma depends on the electron generation and loss mechanisms. Altogether six ionization and chemical reactions relevant to the time scale of breakdown have been taken into account. It has been found that the critical field strength for breakdown is proportional to the pressure and is equal to 2.0 V/(m.Pa). This field strength is in agreement with the experimental results
  • Keywords
    SF6 insulation; chemical reactions; electric breakdown; electron mobility; gas blast circuit breakers; ionisation; plasma transport processes; 3000 K; SF6; arc thermal extinction; axially blown gas blast SF6 circuit breaker; chemical reactions; critical field strength; diatomic equilibrium; dielectric breakdown; electron generation mechanism; electron loss mechanism; electron velocity distribution function; ionization reactions; residual SF6 plasma; Chemicals; Circuit breakers; Dielectric breakdown; Dielectric losses; Electric breakdown; Electrons; Ionization; Plasma chemistry; Plasma temperature; Sulfur hexafluoride;
  • fLanguage
    English
  • Journal_Title
    Dielectrics and Electrical Insulation, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1070-9878
  • Type

    jour

  • DOI
    10.1109/94.590878
  • Filename
    590878