DocumentCode
1251757
Title
Hysteresis in quartz resonators-a review
Author
Kusters, John A. ; Vig, John R.
Author_Institution
Hewlett-Packard Co., Santa Clara, CA, USA
Volume
38
Issue
3
fYear
1991
fDate
5/1/1991 12:00:00 AM
Firstpage
281
Lastpage
290
Abstract
The literature on the frequency versus temperature characteristics of quartz crystal resonators is reviewed. Three papers that deal with frequency versus pressure hysteresis are included, as these may possibly have relevance to frequency versus temperature hysteresis. It is seen that the causes of hysteresis are not well understood. The evidence to date is inconclusive. The mechanisms that can cause hysteresis include: strain changes changes in the quartz, contamination redistribution, oscillator circuitry hysteresis, and apparent hysteresis due to thermal gradients. The results to date seem to indicate that lattice defects are somehow related to thermal hysteresis. Stress relief in the mounting structure can also produce significant hysteresis. As crystal processing techniques have improved. contamination has become less of a problem.<>
Keywords
crystal resonators; quartz; reviews; contamination redistribution; crystal processing; frequency/temperature characteristics; hysteresis; lattice defects; mounting structure; oscillator circuitry; pressure; quartz resonators; strain changes; thermal gradients; Books; Capacitive sensors; Contamination; Contracts; Frequency control; Hysteresis; Oscillators; Resonant frequency; Stability; Temperature;
fLanguage
English
Journal_Title
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher
ieee
ISSN
0885-3010
Type
jour
DOI
10.1109/58.79613
Filename
79613
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