DocumentCode
1252080
Title
Simulating Capacitances to Silicon Quantum Dots: Breakdown of the Parallel Plate Capacitor Model
Author
Thorbeck, Ted ; Fujiwara, Akira ; Zimmerman, Neil M.
Volume
11
Issue
5
fYear
2012
Firstpage
975
Lastpage
978
Abstract
Many electrical applications of quantum dots rely on capacitively coupled gates; therefore, to make reliable devices we need those gate capacitances to be predictable and reproducible. We demonstrate in silicon nanowire quantum dots that gate capacitances are reproducible to within 10% for nominally identical devices. We demonstrate the experimentally that gate capacitances scale with device dimensions. We also demonstrate that a capacitance simulator can be used to predict measured gate capacitances to within 20%. A simple parallel plate capacitor model can be used to predict how the capacitances change with device dimensions; however, the parallel plate capacitor model fails for the smallest devices because the capacitances are dominated by fringing fields. We show how the capacitances due to fringing fields can be quickly estimated.
Keywords
capacitance; capacitors; elemental semiconductors; nanowires; semiconductor device breakdown; semiconductor device models; semiconductor quantum dots; silicon; Si; capacitance simulator; device dimensions; fringing fields; gate capacitance; parallel plate capacitor model; silicon nanowire quantum dots; Capacitance measurement; Capacitors; Logic gates; Predictive models; Quantum capacitance; Silicon; Capacitance; quantum dots (QDS); semiconductor device modeling; single electron transistors;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2012.2206826
Filename
6249786
Link To Document