Title :
Transmission measurements of pellicles for deep-UV lithography
Author :
Partlo, William N. ; Oldham, William G.
Author_Institution :
Dept. of Electr. Eng., Berkeley, CA, USA
fDate :
5/1/1991 12:00:00 AM
Abstract :
Candidate deep-UV pellicle materials were tested for transmission stability under deep-UV exposure. Measurements were made with an exposure apparatus using a KrF excimer laser and a light pipe illuminator. Increased absorption and thickness reduction caused by deep-UV exposure were found in polyvinyl butyral (PVB)-based pellicles. The thickness of the PVB pellicles was monitored in situ, and a dark reaction was found to occur long after the deep-UV exposure is complete. Pellicles made with a second, fluoropolymer material were also tested and found to be stable up to exposures of 10000 J/cm2
Keywords :
materials testing; photolithography; 248 nm; KrF excimer laser; PVB pellicles; dark reaction; deep-UV exposure; deep-UV lithography; deep-UV pellicle materials; fluoropolymer material; light pipe illuminator; polyvinyl butyral; transmission experiments; transmission stability; Absorption; Aging; Biomembranes; Coatings; Lithography; Materials testing; Monitoring; Optical films; Optical materials; Refractive index; Semiconductor materials; Stability;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
