• DocumentCode
    1254150
  • Title

    Transmission measurements of pellicles for deep-UV lithography

  • Author

    Partlo, William N. ; Oldham, William G.

  • Author_Institution
    Dept. of Electr. Eng., Berkeley, CA, USA
  • Volume
    4
  • Issue
    2
  • fYear
    1991
  • fDate
    5/1/1991 12:00:00 AM
  • Firstpage
    128
  • Lastpage
    133
  • Abstract
    Candidate deep-UV pellicle materials were tested for transmission stability under deep-UV exposure. Measurements were made with an exposure apparatus using a KrF excimer laser and a light pipe illuminator. Increased absorption and thickness reduction caused by deep-UV exposure were found in polyvinyl butyral (PVB)-based pellicles. The thickness of the PVB pellicles was monitored in situ, and a dark reaction was found to occur long after the deep-UV exposure is complete. Pellicles made with a second, fluoropolymer material were also tested and found to be stable up to exposures of 10000 J/cm2
  • Keywords
    materials testing; photolithography; 248 nm; KrF excimer laser; PVB pellicles; dark reaction; deep-UV exposure; deep-UV lithography; deep-UV pellicle materials; fluoropolymer material; light pipe illuminator; polyvinyl butyral; transmission experiments; transmission stability; Absorption; Aging; Biomembranes; Coatings; Lithography; Materials testing; Monitoring; Optical films; Optical materials; Refractive index; Semiconductor materials; Stability;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/66.79724
  • Filename
    79724
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1254150