Title :
Demultiplexer with 120 channels and 0.29-nm channel spacing
Author :
Sun, Z.J. ; McGreer, K.A. ; Broughton, J.N.
Author_Institution :
TRLabs, Manitoba Univ., Winnipeg, Man., Canada
Abstract :
A 120-channel WDM demultiplexer was fabricated by etching a concave grating into a SiO/sub 2/-SiON-SiO/sub 2/-Si slab waveguide. The grooves of the grating reflected light by two instances of total internal reflection. The device was suitable for demultiplexing wavelength channels in the 1530-1565-nm range with a 0.29-nm (36 GHz) channel spacing. Each channel had a spectral width (full width at half maximum) of about 0.18 nm. The fiber-to-fiber insertion loss was between -20 dB and -30 dB for most channels. The loss was predominantly due to waveguide absorption and increased dramatically for wavelengths below 1539 nm.
Keywords :
demultiplexing; diffraction gratings; etching; integrated optics; optical communication equipment; optical fabrication; optical fibre losses; optical waveguides; silicon compounds; wavelength division multiplexing; 120-channel WDM demultiplexer fabrication; 1530 to 1565 nm; 1539 nm; SiO/sub 2/-SiON-SiO/sub 2/-Si; SiO/sub 2/-SiON-SiO/sub 2/-Si slab waveguide; concave grating etching; demultiplexing; fiber-to-fiber insertion loss; full width; half maximum; reflected light; spectral width; total internal reflection; waveguide absorption; wavelength channels; Absorption; Channel spacing; Demultiplexing; Etching; Gratings; Insertion loss; Optical fiber devices; Optical reflection; Slabs; Wavelength division multiplexing;
Journal_Title :
Photonics Technology Letters, IEEE