DocumentCode :
1254948
Title :
Fabrication of light-turning mirrors in buried-channel silica waveguides for monolithic and hybrid integration
Author :
Bazylenko, M.V. ; Gross, M. ; Gauja, E. ; Chu, Pak L.
Author_Institution :
Sch. of Electr. Eng., Sydney Univ., NSW, Australia
Volume :
15
Issue :
1
fYear :
1997
fDate :
1/1/1997 12:00:00 AM
Firstpage :
148
Lastpage :
153
Abstract :
A technique for incorporating a mirror into the core of a silica-based channel waveguide is described. Both up reflecting mirrors for hybrid integration and down-reflecting mirrors for monolithic integration can be fabricated using this technique. The proposed fabrication method is based on a combination of low temperature hollow cathode PECVD for silica-based waveguide deposition and a novel technique for forming a reflecting facet by wet chemical etching of PECVD silica
Keywords :
cathodes; etching; integrated optics; integrated optoelectronics; mirrors; optical fabrication; optical waveguides; plasma CVD; silicon compounds; vapour phase epitaxial growth; PECVD silica; SiO2; buried-channel silica waveguides; down-reflecting mirrors; fabrication method; hybrid integration; light-turning mirror fabrication; low temperature hollow cathode PECVD; monolithic integration; reflecting facet; silica-based channel waveguide core mirror; silica-based waveguide deposition; up reflecting mirrors; wet chemical etching; Cathodes; Chemicals; Mirrors; Monolithic integrated circuits; Optical device fabrication; Optical waveguides; Semiconductor waveguides; Silicon compounds; Substrates; Wet etching;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/50.552123
Filename :
552123
Link To Document :
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