• DocumentCode
    1255126
  • Title

    Reverse short-channel effect in metal-induced laterally crystallized polysilicon thin-film transistors

  • Author

    Wong, Man ; Bhat, Gururaj A. ; Kwok, Hoi S.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, Hong Kong
  • Volume
    20
  • Issue
    11
  • fYear
    1999
  • Firstpage
    566
  • Lastpage
    568
  • Abstract
    A reverse short-channel effect, manifested by an increase in the transistor threshold voltage as the channel length is reduced, is observed in conventional metal-induced laterally crystallized thin-film transistors. Such an effect has not been observed in regular solid phase crystallized thin-film transistors and can be eliminated by a brief hydrogen plasma treatment.
  • Keywords
    MOSFET; crystallisation; elemental semiconductors; grain boundaries; passivation; silicon; thin film transistors; AMLCD; H; H plasma treatment; Si-SiO/sub 2/; active matrix LCD; channel length reduction; metal-induced laterally crystallized TFT; polysilicon TFTs; polysilicon thin-film transistors; reverse short-channel effect; transistor threshold voltage; Active matrix liquid crystal displays; Crystallization; Hydrogen; Leakage current; Microwave integrated circuits; Plasma temperature; Silicon; Solids; Thin film transistors; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.798045
  • Filename
    798045