DocumentCode
1255623
Title
Lateral insulated gate bipolar transistor (LIGBT) structure based on partial isolation SOI technology
Author
Udrea, F. ; Milne, W. ; Popescu, Adrian
Author_Institution
Dept. of Eng., Cambridge Univ.
Volume
33
Issue
10
fYear
1997
fDate
5/8/1997 12:00:00 AM
Firstpage
907
Lastpage
909
Abstract
A new LIGBT structure is proposed based on partial isolation SOI technology and demonstrated through numerical simulations. In comparison with conventional SOI LIGBITs, the new structure offers an enhanced RESURF (REduced SURface Field) effect and improved heat dissipation with no compromise in the switching speed and on-state resistance
Keywords
insulated gate bipolar transistors; isolation technology; power semiconductor switches; silicon-on-insulator; RESURF; heat dissipation; lateral insulated gate bipolar transistor; on-state resistance; partial isolation SOI technology; reduced surface field effect; switching speed;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19970587
Filename
592654
Link To Document