Title :
Structure and Ultraviolet Electroluminescence of
Nanocomposite/
Author :
Chen, Miin-Jang ; Shih, Ying-Tsang ; Wu, Mong-Kai ; Chen, Hsing-Chao ; Tsai, Hung-Ling ; Li, Wei-Chih ; Yang, Jer-Ren ; Kuan, Hon ; Shiojiri, Makoto
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
We fabricated and characterized ultraviolet (UV) light-emitting diodes (LEDs) composed of n-ZnO/SiO2-ZnO nanocomposite/p-GaN heterostructures. Significant UV electroluminescence at 387 nm from the n-ZnO layer in this heterostructure LED was observed at a forward-bias current of as low as 1.8 mA. This is ascribed to the high quality of the n-ZnO layer and the effective function of the SiO2-ZnO nanocomposite layer. The SiO2-ZnO nanocomposite layer accomplishes the role of current blocking by forming the larger energy barrier for electron injection from n-ZnO into p -GaN and also contributes to, due to its low refractive index, higher light extraction efficiency from the n-ZnO layer.
Keywords :
III-V semiconductors; III-VI semiconductors; electroluminescence; gallium compounds; light emitting diodes; nanocomposites; refractive index; silicon compounds; wide band gap semiconductors; zinc compounds; GaN; LED; ZnO-SiO2-ZnO; characterized ultraviolet light-emitting diodes; current blocking; electron injection; energy barrier; forward-bias current; light extraction efficiency; nanocomposite heterostructure light-emitting diode structure; refractive index; ultraviolet electroluminescence; wavelength 387 nm; Chemical vapor deposition; Electroluminescence; Gallium nitride; Heterojunctions; Immune system; Light emitting diodes; MOCVD; Optical films; Pulsed laser deposition; Refractive index; Stimulated emission; Substrates; Temperature; Zinc oxide; Atomic layer deposition (ALD); heterostructure light-emitting diode (LED); nanodot; ultraviolet (UV); zinc oxide (ZnO);
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2010.2053375