Progress in CMOS integrated measurement systems

Author

Baltes, Henry ; Brand, Oliver

Author_Institution

Phys. Electron. Lab., Eidgenossische Tech. Hochschule, Zurich, Switzerland

Volume

14

Issue

10

fYear

1999

fDate

10/1/1999 12:00:00 AM

Firstpage

29

Lastpage

34

Abstract

Selected micro- and nano-systems developed recently at the Physical Electronics Laboratory of ETH Zurich are reviewed: (i) a fluxgate microsystem for detection of the Earth´s magnetic field; (ii) a capacitive chemical sensor microsystem for detection of volatile organic compounds in air; and (iii) a parallel scanning AFM chip. The micro- and nano-systems combine sensor structures and readout circuitry on a single chip and are fabricated using industrial CMOS technology in combination with post-processing micromachining and film deposition

Keywords

CMOS integrated circuits; atomic force microscopy; capacitive sensors; digital readout; fluxgate magnetometers; gas sensors; magnetic sensors; micromachining; microsensors; nanotechnology; CMOS integrated measurement systems; Earth magnetic field detection; VOC detection in air; anisotropic etching; capacitive chemical sensor microsystem; electroplated cores; film deposition; fluxgate microsystem; microfluxgate sensors; microsystems; nano-systems; on-chip ADC; parallel scanning AFM chip; piezoresistive deflection; post-processing micromachining; readout circuitry; single chip; CMOS technology; Chemical sensors; Earth; Gas detectors; Laboratories; Magnetic field measurement; Magnetic sensors; Nanostructures; Semiconductor device measurement; Volatile organic compounds;

fLanguage

English

Journal_Title

Aerospace and Electronic Systems Magazine, IEEE

Publisher

ieee

ISSN

0885-8985

Type

jour

DOI

10.1109/62.799626

Filename

799626