• DocumentCode
    1257775
  • Title

    Electron collision cross-section data for plasma modeling

  • Author

    Huo, Winifred M. ; Kim, Yong-Ki

  • Author_Institution
    NASA Ames Res. Center, Moffett Field, CA, USA
  • Volume
    27
  • Issue
    5
  • fYear
    1999
  • fDate
    10/1/1999 12:00:00 AM
  • Firstpage
    1225
  • Lastpage
    1240
  • Abstract
    An overview of the current status in electron collision cross section databases for plasma modeling is presented. Emphasis is on dissociation, ionization, and dissociative ionization. The effect of the operating conditions on the relative importance of different collision mechanisms is discussed. For high density plasmas with low gas pressure, a second collision with electrons becomes likely and metastable states may play a role in the dissociation and ionization processes. A number of outstanding theoretical and experimental issues in the cross-section data are discussed. For the total ionization cross section, a four-parameter fitting formula is found to represent the numerical data well and the parameters for some molecules used in plasma modeling are presented
  • Keywords
    electron impact dissociation; electron impact ionisation; plasma chemistry; plasma collision processes; plasma simulation; 1,1,1-trichlorotrifluoroethane; 1,1,2-trichlorotrifluoroethane; BCl3; Cl2; F2; Franck-Condon overlap; GeH4; NF3; SF6; Si2H6; SiF4; binary encounter Bethe model; collision mechanisms; cross-section data; electron collision cross-section databases; electron impact dissociation; electron impact dissociative ionization; electron impact ionization; ethane; ethene; ethylene; four-parameter fitting formula; hexafluoroethane; high density plasmas; low gas pressure; metastable states; methane; methyl tetrafluoride; octafluoropropane; operating conditions; plasma chemistry; plasma modeling; plasma simulation; potential energy curves; propane; tetrafluoromethane; total ionization cross section; Databases; Electrons; Feeds; Ionization; Metastasis; Plasma applications; Plasma chemistry; Plasma density; Plasma materials processing; Plasma properties;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.799798
  • Filename
    799798