DocumentCode
1257775
Title
Electron collision cross-section data for plasma modeling
Author
Huo, Winifred M. ; Kim, Yong-Ki
Author_Institution
NASA Ames Res. Center, Moffett Field, CA, USA
Volume
27
Issue
5
fYear
1999
fDate
10/1/1999 12:00:00 AM
Firstpage
1225
Lastpage
1240
Abstract
An overview of the current status in electron collision cross section databases for plasma modeling is presented. Emphasis is on dissociation, ionization, and dissociative ionization. The effect of the operating conditions on the relative importance of different collision mechanisms is discussed. For high density plasmas with low gas pressure, a second collision with electrons becomes likely and metastable states may play a role in the dissociation and ionization processes. A number of outstanding theoretical and experimental issues in the cross-section data are discussed. For the total ionization cross section, a four-parameter fitting formula is found to represent the numerical data well and the parameters for some molecules used in plasma modeling are presented
Keywords
electron impact dissociation; electron impact ionisation; plasma chemistry; plasma collision processes; plasma simulation; 1,1,1-trichlorotrifluoroethane; 1,1,2-trichlorotrifluoroethane; BCl3; Cl2; F2; Franck-Condon overlap; GeH4; NF3; SF6; Si2H6; SiF4; binary encounter Bethe model; collision mechanisms; cross-section data; electron collision cross-section databases; electron impact dissociation; electron impact dissociative ionization; electron impact ionization; ethane; ethene; ethylene; four-parameter fitting formula; hexafluoroethane; high density plasmas; low gas pressure; metastable states; methane; methyl tetrafluoride; octafluoropropane; operating conditions; plasma chemistry; plasma modeling; plasma simulation; potential energy curves; propane; tetrafluoromethane; total ionization cross section; Databases; Electrons; Feeds; Ionization; Metastasis; Plasma applications; Plasma chemistry; Plasma density; Plasma materials processing; Plasma properties;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.799798
Filename
799798
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