DocumentCode :
1257775
Title :
Electron collision cross-section data for plasma modeling
Author :
Huo, Winifred M. ; Kim, Yong-Ki
Author_Institution :
NASA Ames Res. Center, Moffett Field, CA, USA
Volume :
27
Issue :
5
fYear :
1999
fDate :
10/1/1999 12:00:00 AM
Firstpage :
1225
Lastpage :
1240
Abstract :
An overview of the current status in electron collision cross section databases for plasma modeling is presented. Emphasis is on dissociation, ionization, and dissociative ionization. The effect of the operating conditions on the relative importance of different collision mechanisms is discussed. For high density plasmas with low gas pressure, a second collision with electrons becomes likely and metastable states may play a role in the dissociation and ionization processes. A number of outstanding theoretical and experimental issues in the cross-section data are discussed. For the total ionization cross section, a four-parameter fitting formula is found to represent the numerical data well and the parameters for some molecules used in plasma modeling are presented
Keywords :
electron impact dissociation; electron impact ionisation; plasma chemistry; plasma collision processes; plasma simulation; 1,1,1-trichlorotrifluoroethane; 1,1,2-trichlorotrifluoroethane; BCl3; Cl2; F2; Franck-Condon overlap; GeH4; NF3; SF6; Si2H6; SiF4; binary encounter Bethe model; collision mechanisms; cross-section data; electron collision cross-section databases; electron impact dissociation; electron impact dissociative ionization; electron impact ionization; ethane; ethene; ethylene; four-parameter fitting formula; hexafluoroethane; high density plasmas; low gas pressure; metastable states; methane; methyl tetrafluoride; octafluoropropane; operating conditions; plasma chemistry; plasma modeling; plasma simulation; potential energy curves; propane; tetrafluoromethane; total ionization cross section; Databases; Electrons; Feeds; Ionization; Metastasis; Plasma applications; Plasma chemistry; Plasma density; Plasma materials processing; Plasma properties;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.799798
Filename :
799798
Link To Document :
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