• DocumentCode
    1258074
  • Title

    High power microwave generation by a coaxial virtual cathode oscillator

  • Author

    Jiang, Weihua ; Woolverton, Kevin ; Dickens, James ; Kristiansen, Magne

  • Author_Institution
    Dept. of Electr. Eng. & Phys., Texas Tech. Univ., Lubbock, TX, USA
  • Volume
    27
  • Issue
    5
  • fYear
    1999
  • fDate
    10/1/1999 12:00:00 AM
  • Firstpage
    1538
  • Lastpage
    1542
  • Abstract
    A new type of virtual cathode oscillator, the coaxial vircator, was studied analytically and experimentally. A one-dimensional analytical model was used to describe the steady-state behavior of the electron beam and the virtual cathode, from which the diode current, the space-charge limited current, the virtual cathode position, and the estimated oscillation frequency were obtained. The experiments were carried out with typical electron-beam parameters of 500 kV, 40 kA, and 30 ns, where pulsed microwaves of 400 MW in peak power and 2 GHz in frequency have been obtained. The energy efficiency from the electron beam to microwaves was ~2%. This efficiency is expected to be improved by increasing the microwave field strength around the vircator
  • Keywords
    UHF generation; UHF oscillators; microwave generation; relativistic electron beam tubes; space-charge-limited conduction; vircators; 2 GHz; 2 percent; 30 ns; 40 kA; 400 MW; 500 kV; coaxial vircator; coaxial virtual cathode oscillator; diode current; electron beam; electron-beam parameters; energy efficiency; frequency; high power microwave generation; microwave field strength; microwaves; one-dimensional analytical model; oscillation frequency; peak power; pulsed microwaves; space-charge limited current; steady-state behavior; vircator; virtual cathode; virtual cathode oscillator; virtual cathode position; Analytical models; Cathodes; Coaxial components; Diodes; Electron beams; Energy efficiency; Frequency estimation; High power microwave generation; Microwave oscillators; Steady-state;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.799836
  • Filename
    799836