Title :
A sub-40-ns chain FRAM architecture with 7-ns cell-plate-line drive
Author :
Takashima, Daisaburo ; Shuto, Susumu ; Kunishima, Iwao ; Takenaka, Hiroyuki ; Oowaki, Yukihito ; Tanaka, Shin-ichi
Author_Institution :
Res. & Dev. Center, Toshiba Corp., Kawasaki, Japan
fDate :
11/1/1999 12:00:00 AM
Abstract :
A nonvolatile chain FRAM adopting a new cell-plate-line drive technique was demonstrated. Two key circuit techniques, a two-way metal cell-plate line and a cell-plate line shared with 16 cells, reduce cell-plate-line delay to 7 ns and reduce plate drive area to 1/5. The total cell-plate-line delay, including cell transistor delay due to eight cells in series, is reduced to 15 μs, in contrast to 30-100-ns delay of the conventional FRAM. The die size is reduced to 86% that of the conventional FRAM by reduction of the plate driver area and sense amplifier area, assuming the same memory cell size. A prototype 16-kb chain FRAM chip was fabricated using 0.5 μm rule one-polycide and two-metal CMOS process. The memory cell size was 13.26 μm2 using a 3.24-μm2 capacitor. Thanks to the fast cell-plate-line drive, the chain FRAM test chip has achieved the fastest random access time, 37 ns, and read/write cycle time, 80 ns, at 3.3 V so far reported. The chain FRAM has also realized Vdd min of 2.3 V and 1010 read/write cycles
Keywords :
CMOS memory circuits; ferroelectric storage; random-access storage; 0.5 micron; 16 kbit; 2.3 to 3.3 V; 7 to 80 ns; cell-plate-line drive; chain FRAM architecture; ferroelectric RAM; nonvolatile chain FRAM; one-polycide two-metal CMOS process; plate driver area reduction; sense amplifier area reduction; two-way metal cell-plate line; CMOS process; Capacitors; Delay; Driver circuits; Ferroelectric films; Ferroelectric materials; Microelectronics; Nonvolatile memory; Prototypes; Random access memory;
Journal_Title :
Solid-State Circuits, IEEE Journal of