• DocumentCode
    1259173
  • Title

    Effects of segregated sulfur on recrystallization texture and magnetic induction in thin-gauged 3% silicon steel

  • Author

    Chai, K.H. ; Heo, N.H. ; Na, J.G. ; Jeong, H.-T. ; Lee, S.R.

  • Author_Institution
    Div. of Metals, Korea Inst. of Sci. & Technol., Seoul, South Korea
  • Volume
    35
  • Issue
    5
  • fYear
    1999
  • fDate
    9/1/1999 12:00:00 AM
  • Firstpage
    3373
  • Lastpage
    3375
  • Abstract
    During final annealing at 1200°C under a high vacuum, changes in recrystallization texture with final annealing time were observed in thin-gauged 3% Si-Fe alloys. In the alloy containing 30 ppm bulk sulfur, the recrystallization texture varied from the {111} ⟨uvw⟩ to the {001} ⟨uvw⟩ and finally to the {110}⟨001⟩ Goss texture, resulting in higher magnetic induction than 1.90 T. The trough in magnetic induction, which corresponds to the relatively high surface-segregated sulfur range, is due to the magnetically detrimental effect of those textures, i.e. the {111} ⟨uvw⟩ and the {001} ⟨uvw⟩. In the alloy containing 6 ppm bulk sulfur, the correlation between magnetic induction and surface-segregated sulfur was the same as that in the other alloy. These results clearly indicate that the surface energy induced recrystallization in the thin-gauged 3% Si-Fe alloys is strongly affected by the segregation and the evaporation of sulfur
  • Keywords
    alloy steel; annealing; electromagnetic induction; ferromagnetic materials; recrystallisation texture; segregation; silicon alloys; sulphur; surface energy; 1200 C; Si-steel; final annealing time; magnetic induction; magnetically detrimental effect; recrystallization texture; segregated S; thin-gauged 3% silicon steel; Annealing; Inorganic materials; Machinery; Magnetic materials; Magnetosphere; Materials science and technology; Power engineering and energy; Silicon; Steel; Surface texture;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.800528
  • Filename
    800528