Effects of process parameters on structure and magnetic properties of sputtered Ni-Zn ferrite thin films

Author

Lee, Jang-Sik ; Lee, Byung-II ; Joo, Seung-Ki

Author_Institution

Sch. of Mater. Sci. & Eng., Seoul Nat. Univ., South Korea

Volume

35

Issue

5

fYear

1999

fDate

9/1/1999 12:00:00 AM

Firstpage

3415

Lastpage

3417

Abstract

Ni-Zn ferrite thin films were prepared by RF magnetron sputtering at room temperature. The structure and magnetic properties of the as-deposited films were investigated as a function of oxygen partial pressure, working pressure and RF power. Deposition conditions greatly affect the crystallinity and magnetic properties of the Ni-Zn ferrite thin films. Ni-Zn ferrite thin films with spinel structure could be obtained by adjusting the process parameters without substrate heating or post heat treatment. The Ni-Zn ferrite thin film deposited with the optimized condition at room temperature showed saturation magnetization of 170 emu/cm³ and coercivity of 35 Oe

Keywords

coercive force; ferrites; magnetic thin films; magnetisation; nickel compounds; sputtered coatings; zinc compounds; 300 K; Ni-Zn ferrite; NiZnFeO; O₂ partial pressure dependence; RF magnetron sputtering; RF power dependence; as-deposited films; coercivity; crystallinity; deposition conditions; magnetic properties; process parameters effects; saturation magnetization; spinel structure; sputtered thin films; working pressure dependence; Crystallization; Ferrite films; Heat treatment; Magnetic films; Magnetic properties; Radio frequency; Saturation magnetization; Sputtering; Substrates; Temperature;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.800542

Filename

800542