Fabrication of double rectangular type FeTaN film inductors

Author

Shin, Dong-hoon ; Kim, Chung-Sik ; Jeong, Jong-han ; Nam, Seoung-eui ; Kim, Hyoung-june

Author_Institution

Dept. of Metall. Eng. & Mater. Sci., Hong Ik Univ., Seoul, South Korea

Volume

35

Issue

5

fYear

1999

fDate

9/1/1999 12:00:00 AM

Firstpage

3511

Lastpage

3513

Abstract

A double rectangular spiral inductor is fabricated using FeTaN films. The inductor is composed of internal coils sandwiched by magnetic layers. Characteristics of inductor performance are investigated with an emphasis on planarization of magnetic films. In the absence of the planarization process, the grating topology of upper magnetic films over the coil arrays degrades the soft magnetic properties and the inductor performance. It also induces a uniaxial magnetic anisotropy with the easy axis aligned to the magnetic flux direction. This alignment prevents the upper magnetic films from contributing to the total induction. Glass bonding is a viable method for achieving a completely planar inductor structure. The planar inductor with glass bonding shows excellent performance: inductance of 1.1 μH, Q factor of 7 (at 5 MHz), and a DC current capability up to 100 mA

Keywords

Q-factor; coils; ferromagnetic materials; inductors; iron alloys; magnetic anisotropy; magnetic flux; magnetic thin film devices; soft magnetic materials; sputter deposition; sputtered coatings; surface topography; surface treatment; tantalum alloys; 100 mA; 5 MHz; DC current capability; FeTaN; FeTaN film inductors; coil arrays; double rectangular type; glass bonding; grating topology; inductor fabrication; inductor performance characteristics; internal coils; magnetic flux direction; magnetic layers; planar inductor structure; planarization process; soft magnetic properties; spiral inductor; uniaxial magnetic anisotropy; Bonding; Coils; Fabrication; Glass; Inductors; Magnetic anisotropy; Magnetic films; Magnetic flux; Planarization; Spirals;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.800573

Filename

800573