Title :
An accurate measurement of magnetostriction of thin films by using nano-indentation system
Author :
Shima, Toshiyuki ; Fujimori, Hiroyasu
Author_Institution :
Inst. for Mater. Res., Tohoku Univ., Sendai, Japan
fDate :
9/1/1999 12:00:00 AM
Abstract :
We have constructed a simple and sensitive tool for the measurement of magnetostriction of thin films. This tool is based on a commercial nano-indentation system, which enable the measurement of the elastic properties of small samples, such as thin films and precipitates, as well as the magnetostrictively induced deflection of cantilevered substrates on which thin film are deposited. The reliability of the present tool is tested by measuring Permalloy thin films. The resolution of the displacement is estimated to be less than 1 nm. Combined with an accurate determination of Young´s modulus, the present system appears suitable to measure magnetostriction down to 10 -7, if a 1 μm thick film coated on a 0.3 mm thick film is used
Keywords :
Permalloy; Young´s modulus; ferromagnetic materials; indentation; magnetic thin films; magnetic variables measurement; magnetostriction; 0.3 mm; 1 mum; NiFe; Permalloy thin films; Youngs modulus; accurate measurement; elastic properties; magnetostriction; magnetostrictively induced deflection; nanoindentation system; thin films; Displacement measurement; Force measurement; Magnetic field measurement; Magnetic films; Magnetic properties; Magnetostriction; Sputtering; Substrates; Thickness measurement; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
