• DocumentCode
    1260381
  • Title

    Magnetization reversal process of 360°-domain walls observed by magnetic force microscope in exchange-biased NiFe films

  • Author

    Cho, Hae Seok ; Fujiwara, Hideo

  • Author_Institution
    Centre for Mater. for Inf. Technol., Alabama Univ., Tuscaloosa, AL, USA
  • Volume
    35
  • Issue
    5
  • fYear
    1999
  • fDate
    9/1/1999 12:00:00 AM
  • Firstpage
    3868
  • Lastpage
    3870
  • Abstract
    The magnetization reversal process of an exchange biased NiFe layer was investigated around 360°-domain wall loops by magnetic force microscopy (MFM) in Glass/Ta(10 nm)/NiFe(7.2 nm)/FeMn(8.0 nm)/Ta(5 nm). The sample was prepared by rf-magnetron sputtering and characterized with vibrating sample magnetometer (VSM). The reversal process was performed dominantly by rotation due to a large unidirectional anisotropy and probably due to a substantial orientation deviation of the local pinning field from the easy axis of the NiFe-layer. The magnetization reversal process performed by wall nucleation and growth was also observed. The dominant reversal mechanism in the exchange-biased ferromagnetic layer was discussed in terms of anisotropy energy
  • Keywords
    exchange interactions (electron); ferromagnetic materials; iron alloys; magnetic anisotropy; magnetic domain walls; magnetic force microscopy; magnetisation reversal; nickel alloys; spin valves; sputtered coatings; 360°-domain walls; NiFe; anisotropy energy; domain wall growth; exchange-biased NiFe films; exchange-biased ferromagnetic layer; large unidirectional anisotropy; local pinning field; magnetic force microscope; magnetization reversal process; orientation deviation; reversal process; rf-magnetron sputtering; wall nucleation; Anisotropic magnetoresistance; Atomic force microscopy; Magnetic domain walls; Magnetic domains; Magnetic films; Magnetic force microscopy; Magnetic forces; Magnetization reversal; Magnetometers; Sputtering;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.800691
  • Filename
    800691