DocumentCode
1261690
Title
Increasing the resistivity of electrodeposited high BS CoNiFe thin film
Author
Yokoshima, Tokihiko ; Kaseda, Manabu ; Yamada, Masahiro ; Nakanishi, Takuya ; Momma, Toshiyuki ; Osaka, Tetsuya
Author_Institution
Dept. of Appl. Chem., Waseda Univ., Tokyo, Japan
Volume
35
Issue
5
fYear
1999
fDate
9/1/1999 12:00:00 AM
Firstpage
2499
Lastpage
2501
Abstract
In order to increase the resistivity of electrodeposited high B S CoNiFe thin film, the effect of an organic additive such as diethylenetriamine (DET) added to the plating bath was investigated. The values of ρ and HC were gradually increased as a function of DET concentration. The desirable soft magnetic CoNiFe thin film with ρ=25-90 μΩ-cm under the conditions of BS>1.9 T and HC<2.5 Oe was developed as function of carbon in the deposited films. Additionally, the high resistivity CoNiFe thin film with ρ=130 μΩ-cm was established under the conditions of B S=1.7 T and HC<6 0e
Keywords
cobalt alloys; electrical resistivity; electrodeposition; ferromagnetic materials; iron alloys; magnetic flux; magnetic thin films; metallic thin films; nickel alloys; soft magnetic materials; 1.7 T; 1.9 T; 130 muohmcm; 25 to 90 muohmcm; CoNiFe; DET concentration; diethylenetriamine; electrodeposited high BS CoNiFe thin film; high resistivity CoNiFe thin film; organic additive; plating bath; resistivity; soft magnetic CoNiFe thin film; Additives; Conductivity; Magnetic films; Magnetic flux; Magnetic materials; Magnetic recording; Plasma measurements; Saturation magnetization; Soft magnetic materials; Transistors;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.800871
Filename
800871
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