Title :
Self-alignment trench-pole writer
Author :
Yoda, H. ; Sakata, H. ; Hashimoto, S. ; Tateyama, K. ; Hara, M. ; Sahashi, M.
Author_Institution :
Res. & Dev. Center, Toshiba Corp., Kawasaki, Japan
fDate :
9/1/1999 12:00:00 AM
Abstract :
We have succeeded in designing, fabricating, and testing self-alignment trench-pole write heads. 1 μm narrow track heads were fabricated by a newly developed self-alignment trench process and showed large overwrite of over 40 dB for low-noise high coercivity media with Hc=2800 Oe, even with a large throat height of 3 μm. This trench pole writer showed high potential for submicrometer narrow track application
Keywords :
isolation technology; magnetic heads; magnetoresistive devices; photoresists; sputter etching; MFM image; SEM image; high efficiency; ion milled; large overwrite; low-noise high coercivity media; narrow track heads; planarization layer; process design; self-aligned mask; self-alignment trench-pole write heads; submicrometer narrow track application; thin photoresist; Coils; Computer hacking; Etching; Insulation life; Magnetic flux; Magnetic heads; Planarization; Research and development; Resists; Saturation magnetization;
Journal_Title :
Magnetics, IEEE Transactions on
