• DocumentCode
    1261784
  • Title

    Highly defined narrow track write heads fabricated by focused ion beam trimming with the Al2O3 refilling process

  • Author

    Ishi, Tsutomu ; Nonaka, Yoshhiro ; Matsubara, Takamitsu ; Ishiwata, Nobuyuki

  • Author_Institution
    Memory Res. Labs., NEC Corp., Tokyo, Japan
  • Volume
    35
  • Issue
    5
  • fYear
    1999
  • fDate
    9/1/1999 12:00:00 AM
  • Firstpage
    2541
  • Lastpage
    2543
  • Abstract
    We have developed a focused ion beam trimmed write head using Al 2O3 refilling, in which an Al2O3 film was deposited and a two-step lapping process was performed after FIB trimming at the air bearing surface. This process provided highly defined pole edges without any rounded corners, well-filled hollows, and a damage-free read element. Good environment-proof characteristics were also obtained, because a diamond-like carbon film was deposited as a protective layer on the element after FIB trimming. The fabricated head showed good overwrite characteristics in half-micron width writing
  • Keywords
    focused ion beam technology; magnetic heads; sputter etching; Al2O3; FIB trimming; air bearing surface; alumina refilling process; damage-free read element; diamond-like carbon film; environment-proof characteristics; half-micron width writing; highly defined narrow track write heads; highly defined pole edges; overwrite characteristics; pole tip angle; pole trimming; protective layer; spin valve read element; two-step lapping process; well-filled hollows; Chemical elements; Diamond-like carbon; Ion beams; Lapping; Magnetic heads; National electric code; Protection; Scanning electron microscopy; Sputtering; Writing;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.800884
  • Filename
    800884