Magnetic properties of ion beam deposited CoPt and CoCrPt films for hard bias application in high density magnetoresistive heads

Author

Leng, Q. ; Mao, M. ; Hiner, C. ; Miloslavsky, L. ; Miller, M. ; Tran, S. ; Qian, C. ; Tong, H.C.

Author_Institution

Read-Rite Corp., Fremont, CA, USA

Volume

35

Issue

5

fYear

1999

fDate

9/1/1999 12:00:00 AM

Firstpage

2553

Lastpage

2555

Abstract

We have observed a 30% of enhancement in coercivity, H_c, or a 40% increase in remnant magnetization in ion beam deposited (IBD) Cr/CoPt films as compared to IBD Cr/CoCrPt films. In addition, the magnetic properties of these hard bias films exhibit a strong dependence of on substrate and underlayer. Higher coercivity values associated with enhanced hcp Co (101¯0) crystallographic orientation were measured in films grown on substrates in the preference order of glass, Si/Al₂O₃ and Si. CoPt films grown on CrV underlayer show lower H_c values than films deposited on Cr underlayer. H_c exhibits a maximum with increasing Cr underlayer thickness for both Cr/CoPt and Cr/CoCrPt films. This Cr thickness dependence of H_c is correlated well with that of Co (101¯0)/(0002) X-ray diffraction peak intensity ratio, indicating the role of crystallographic texture in control of coercivity of IBD hard bias films

Keywords

chromium alloys; cobalt alloys; coercive force; ferromagnetic materials; magnetic heads; magnetic thin films; magnetoresistive devices; platinum alloys; remanence; sputtered coatings; CoCrPt; CoPt; Cr-CoCrPt; Cr-CoPt; XRD peak intensity ratio; coercivity; crystallographic texture role; enhanced HCP crystallographic orientation; hard bias application; high density magnetoresistive heads; ion beam deposited films; magnetic properties; recording head; remnant magnetization; substrate dependence; thickness dependence; underlayer dependence; Chromium; Coercive force; Crystallography; Glass; Ion beams; Magnetic films; Magnetic properties; Magnetization; Semiconductor films; X-ray diffraction;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.800888

Filename

800888