DocumentCode
1261974
Title
MR sensor oxidation mechanism at high temperature
Author
Xie, Chang ; Davis, Marshall ; Schultz, Allan
Author_Institution
Seagate Recording Heads, Bloomington, MN, USA
Volume
35
Issue
5
fYear
1999
fDate
9/1/1999 12:00:00 AM
Firstpage
2619
Lastpage
2621
Abstract
A lifetime stress experiment was done on MR heads, followed by TEM analysis to decide whether higher temperatures induced structural degradation in the MRE stack. After 160 hrs, of testing at various bias currents, it was found that heads with sensor operating temperatures below 280°C had little or no resistance increase, heads operated between 280 and 340°C had varying degrees of resistance increase, and all heads operated above 340°C burned out. The immediate cause of the resistance increase is shown to be oxidation of the MR film. A combination of TEM and electrical data, along with thermodynamic analysis of the TaN cap and the alumina 2nd gap, indicates that the likely mechanism is attack of the TaN cap by water vapor released from the alumina, followed by oxidation of the MR film
Keywords
high-temperature effects; magnetic heads; magnetoresistive devices; oxidation; transmission electron microscopy; 280 to 340 C; Al2O3; MR sensor; TEM; TaN; TaN cap; alumina gap; electrical resistance; high temperature oxidation; lifetime stress; magnetoresistive head; thermodynamic analysis; Degradation; Electric resistance; Electrons; Failure analysis; Life testing; Magnetic heads; Oxidation; Temperature sensors; Thermal stresses; Thermodynamics;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.800914
Filename
800914
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