In-situ conductance measurement of surface specularity of NiFe, Co, Cu, Ag and Ta thin films

Author

Yamada, Kenichiro ; Bailey, William E. ; Féry, Christophe ; Wang, Shan X.

Author_Institution

Dept. of Mater. Sci. & Eng., Stanford Univ., CA, USA

Volume

35

Issue

5

fYear

1999

fDate

9/1/1999 12:00:00 AM

Firstpage

2979

Lastpage

2981

Abstract

We have performed in-situ sheet conductance measurements of Co, Cu, Ni₈₀Fe₂₀, Ag, and Ta films during their growth on NiO or SiO₂ surfaces. The specularity and the roughness of the films are determined based on the Fuchs-Namba model. The roughness from the Fuchs-Namba model are compared with that measured by AFM. The material dependence of specularity is obtained. No appreciable difference in specularity has been found when the magnetic films are deposited on NiO or SiO₂ surfaces

Keywords

atomic force microscopy; cobalt; copper; electrical resistivity; iron alloys; magnetic thin films; nickel alloys; rough surfaces; silver; sputter deposition; surface topography; tantalum; Ag; Co; Cu; Fuchs-Namba model; NiFe; NiO; NiO surfaces; SiO₂; SiO₂ surfaces; Ta; giant magnetoresistance; growth; in-situ conductance measurement; magnetic films; material dependence; roughness; spin valves; surface specularity; thin films; Conductive films; Conductivity; Giant magnetoresistance; Magnetic films; Rough surfaces; Spin valves; Sputtering; Substrates; Surface roughness; Transistors;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.801053

Filename

801053