DocumentCode :
1262863
Title :
Nonequilibrium strain and Curie temperature in as-deposited Mn ferrite thin films by RF sputtering
Author :
Tanaka, Toshikam
Author_Institution :
Dept. of Inf. & Control Eng., Toba Nat. Coll. of Maritime Technol., Japan
Volume :
35
Issue :
5
fYear :
1999
fDate :
9/1/1999 12:00:00 AM
Firstpage :
3010
Lastpage :
3012
Abstract :
Nonequilibrium lattice distances and Curie temperatures have been observed in as-deposited Mn ferrite thin films by rf sputtering at RT and 300°C, although they show crystalline X-ray diffraction patterns. The (400) lattice distance is larger, while the (111), (222), and (444) lattice distances are smaller than the bulk values. This implies that a compressive stress along the [100] axis and a tensile stress along the [111] axis are present in as-deposited films. The Curie temperatures of as-deposited films are 60~160°C higher than the bulk value. The degree of the nonequilibrium is larger for the films deposited at a lower substrate temperature. The nonequilibrium in as-deposited films relaxes with heat treatment in an N2 atmosphere at 610°C
Keywords :
Curie temperature; X-ray diffraction; ferrites; heat treatment; internal stresses; magnetic thin films; manganese compounds; sputtered coatings; Curie temperature; Mn ferrite thin film; MnFe2O4; RF sputtering; X-ray diffraction; compressive stress; heat treatment; nonequilibrium strain; tensile stress; Capacitive sensors; Compressive stress; Crystallization; Ferrite films; Heat treatment; Lattices; Sputtering; Temperature; Tensile stress; X-ray diffraction;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.801068
Filename :
801068
Link To Document :
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