Electro-ferrite plating of magnetite at 24-80°C

Author

Nishimura, Kazuhiro ; Kitamoto, Yoshitaka ; Abe, Masanori

Author_Institution

Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan

Volume

35

Issue

5

fYear

1999

fDate

9/1/1999 12:00:00 AM

Firstpage

3043

Lastpage

3045

Abstract

At room temperature (24°C) magnetite (Fe₃O₄) films are successfully grown from an aqueous solution utilizing anodic oxidation of Fe²⁺ to Fe³⁺. Applying DC anodic voltage of 0.4 V, single phase Fe₃O₄ films are grown at various temperatures from 24 to 80°C on NESA glass substrates from mixed solutions of FeCl₂+NH₃. Fixing the concentration of FeCl₂, the concentrations at which we can obtain the highest film deposition rate are determined at 24°C and 80°C. The films have a saturation magnetization of magnitude equal to that of bulk sample

Keywords

anodisation; electroplating; ferrites; magnetic thin films; magnetisation; 0.4 V; 24 to 80 C; DC anodic voltage; Fe₃O₄; Fe₃O₄ films; Fe²⁺; Fe³⁺; FeCl₂; NESA glass substrates; NH₃; anodic oxidation; aqueous solution; electro-ferrite plating; film deposition rate; magnetite; mixed solutions; room temperature; saturation magnetization; single phase Fe₃O₄ films; Electrodes; Ferrite films; Glass; Magnetic films; Plasma temperature; Saturation magnetization; Scanning electron microscopy; Substrates; Surface morphology; X-ray scattering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.801079

Filename

801079