DocumentCode
1263062
Title
Comparison between patterned and unpatterned electrodeposited spin-valve sensors
Author
Attenborough, Karen ; Boeve, Hans ; De Boeck, Jo ; Borghs, Gustaaf ; Celis, Jean-Pierre
Author_Institution
Dept. MTM, Katholieke Univ., Leuven, Belgium
Volume
35
Issue
5
fYear
1999
fDate
9/1/1999 12:00:00 AM
Firstpage
3094
Lastpage
3096
Abstract
Electrodeposited spin-valves on GaAs substrates were patterned down into 80 μm, 4 μm and 2 μm strips. A symmetric spin-valve configuration is used which incorporates an artificially hard substructure. Sensitivities up to 1.5%/Oe were observed, these being the highest ever observed in electrodeposited structures. Upon patterning an increased antiferromagnetic contribution of the inner hard substructure was seen
Keywords
antiferromagnetic materials; cobalt; copper; electrodeposits; magnetic anisotropy; magnetic sensors; spin valves; Co-Cu; GaAs; antiferromagnetic contribution; hard substructure; inner hard substructure; magnetic anisotropy; patterned electrodeposited spin-valve sensors; symmetric spin-valve configuration; unpatterned electrodeposited spin-valve sensors; Antiferromagnetic materials; Buffer layers; Electrical resistance measurement; Gallium arsenide; Magnetic field measurement; Magnetic separation; Resists; Semiconductor device measurement; Strips; Substrates;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.801095
Filename
801095
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