• DocumentCode
    1263214
  • Title

    Electroless nickel bumping of aluminum bondpads. II. Electroless nickel plating

  • Author

    Hutt, David A. ; Liu, Changqing ; Conway, Paul P. ; Whalley, David C. ; Mannan, Samjid H.

  • Author_Institution
    Wolfson Sch. of Mech. & Manuf. Eng., Loughborough Univ, UK
  • Volume
    25
  • Issue
    1
  • fYear
    2002
  • fDate
    3/1/2002 12:00:00 AM
  • Firstpage
    98
  • Lastpage
    105
  • Abstract
    Electroless nickel has been used for many decades to provide a hard, corrosion resistant surface finish to engineering components. In recent years, its application has been extended to the electronics industry for the production of solderable surfaces on printed circuit boards, which utilize a further thin gold coating to prevent oxidation of the nickel surface. The recent interest in the use of flip-chip technology in electronics manufacture has required the development of low cost methods for solder bumping of semiconductor wafers. The electroless nickel process has been considered as a suitable candidate for the deposition of a solderable under bump metallization (UBM) layer onto the Al bondpads. However, the extension of existing electroless nickel plating processes to this new application requires greater understanding of the technique. In particular, the coating of the small isolated bondpads on the wafer surface introduces difficulties that make the use of many commercially available solutions impossible. This paper reports the results of a number of experiments carried out to investigate the electroless nickel bumping of Al bondpads and highlights the issues that need to be considered when selecting materials and techniques
  • Keywords
    aluminium; electroless deposition; flip-chip devices; integrated circuit bonding; integrated circuit interconnections; integrated circuit metallisation; integrated circuit packaging; microassembling; nickel; soldering; Al; Al bondpads; Al-Ni; aluminum bondpads; corrosion resistant surface finish; electroless nickel bumping; electroless nickel plating; electroless nickel process; electronics industry; electronics manufacture; flip-chip technology; isolated bondpads; low cost methods; oxidation; printed circuit boards; semiconductor wafers; solder bumping; solderable UBM layer; solderable surfaces; solderable under bump metallization layer; thin gold coating; wafer bumping; wafer surface; Aluminum; Coatings; Corrosion; Electronics industry; Gold; Nickel; Printed circuits; Production; Surface finishing; Wafer bonding;
  • fLanguage
    English
  • Journal_Title
    Components and Packaging Technologies, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1521-3331
  • Type

    jour

  • DOI
    10.1109/6144.991181
  • Filename
    991181