Title :
Modeling Short-Channel Effect of Elliptical Gate-All-Around MOSFET by Effective Radius
Author :
Zhang, Lining ; Li, Lin ; He, Jin ; Chan, Mansun
Author_Institution :
Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
Abstract :
Gate-all-around (GAA) MOSFETs with elliptical cross section are studied in this letter. From the solution of the Poisson equation, an effective radius concept (Reff) is proposed to convert elliptical GAA MOSFETs into equivalent circular GAA MOSFETs for the study of short-channel effect. The Reff approach is used to estimate the subthreshold swing, drain-induced barrier lowering, and Qon/Qoff ratio of elliptical GAA MOSFETs. The predictions are validated by numerical 3-D TCAD simulations, and good agreement is achieved. Reff is also simplified to an area-to-perimeter ratio of the channel under some special conditions, and its physical meaning is explained.
Keywords :
MOSFET; technology CAD (electronics); TCAD simulations; effective radius; elliptical cross section; elliptical gate-all-around MOSFET; modeling short-channel effect; Electron devices; Logic gates; MOSFET circuits; Mathematical model; Numerical models; Predictive models; Silicon; Effective radius; gate-all-around (GAA); nanowire; short-channel effects (SCEs);
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2011.2159358