DocumentCode :
1267457
Title :
An improved transmission-line model for MOS transistors
Author :
Abou-Allam, Eyad ; Manku, Tajinder
Author_Institution :
Dept. of Electr. & Comput. Eng., Waterloo Univ., Ont., Canada
Volume :
46
Issue :
11
fYear :
1999
fDate :
11/1/1999 12:00:00 AM
Firstpage :
1380
Lastpage :
1387
Abstract :
In this paper, we present a high-frequency small-signal model for MOSFET devices operating in the saturation regime. The model is based on a transmission-line treatment of the gate region, taking into account the distributed resistance-capacitance effects along the width of the device. The gate-source resistance, as well as the induced gate noise arising from the nonquasi-static operation, are included in the model. Closed-form solution of the noise and the y-parameters are obtained. The model is verified with measurements of an 0.8-μm device. The y-parameters model is in close agreement with the measured parameters up to 15 GHz, which is higher than the fT of the device. The noise model was also verified by comparing the modeled and measured noise resistance
Keywords :
MOSFET; UHF field effect transistors; microwave field effect transistors; semiconductor device models; semiconductor device noise; 0 to 15 GHz; 0.8 micron; MOS transistors; closed-form solution; distributed resistance-capacitance effects; gate region; gate-source resistance; high-frequency small-signal model; induced gate noise; measured noise resistance; nonquasi-static operation; saturation regime; transmission-line model; y-parameters; CMOS technology; Capacitance; Circuit noise; Cutoff frequency; Electrical resistance measurement; MOSFET circuits; Radio frequency; Semiconductor device modeling; Transmission line measurements; Transmission lines;
fLanguage :
English
Journal_Title :
Circuits and Systems II: Analog and Digital Signal Processing, IEEE Transactions on
Publisher :
ieee
ISSN :
1057-7130
Type :
jour
DOI :
10.1109/82.803477
Filename :
803477
Link To Document :
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